Table 2 Summary of the experimental results for films deposited with V bias = −100 V pulsed at 100 kHz
From: Pulsed bias effect on roughness of TiO2:Nb films deposited by grid assisted magnetron sputtering
–Duty cycle | Av. grain size | Av. surface roughness (Sa) | Nb/Ti (%wt) |
|---|---|---|---|
(a) raw substrate | - | 1.35 nm | - |
(b) 30%; | 90 nm | 1.58 nm | 0.12±0.01 |
(c) 50%; | 100 nm | 2.13 nm | |
(d) 70%; | 145 nm | 4.17 nm |