Pulsed bias effect on roughness of TiO2:Nb films deposited by grid assisted magnetron sputtering

Scholtz, Juliano Sadi; Stryhalski, Joel; Sagás, Julio César; Recco, Abel André Cândido; Mezaroba, Marcello; Fontana, Luís César

doi:10.1186/s40563-015-0031-7

Applied Adhesion Science

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Last updated: Tue, 23 Apr 2024 22:32:26 Z

Pulsed bias effect on roughness of TiO₂:Nb films deposited by grid assisted magnetron sputtering

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