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Applied Adhesion Science

Table 1 Summary of the experimental parameters

From: Pulsed bias effect on roughness of TiO2:Nb films deposited by grid assisted magnetron sputtering

Variable

Value

Deposition time

30 min.

Substrate temperature

300°C

Substrate bias

-100 V

Target voltage

-400 V

Target current

1.0 A

Oxygen mass flow rate

2.2 sccm

Argon mass flow rate

2.6 sccm

Base pressure

10-5 Torr

Working pressure

3 mTorr

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