Table 1 C, O and Si elementary composition evaluated with XPS, shown in at% of the glass
Glass side | Elementary composition on glass surfaces with different pretreatment in atomic percentage (at%) of C, O and Si | ||
|---|---|---|---|
C1s | O1s | Si2p | |
Tin side, untreated surface | 56.1 | 27.5 | 8.3 |
Tin side, untreated surface after light sputter | 2.2 | 61.0 | 23.2 |
Tin side, plasma treated surface | 10.6 | 55.8 | 18.1 |
Fire side, untreated surface | 45.3 | 34.5 | 12.4 |
Fire side, untreated surface after light sputter | 2.0 | 62.7 | 24.8 |
Fire side, plasma treated surface | 9.1 | 59.1 | 20.4 |